A major breakthrough in domestic substitution! Gice (Nanjing) has successfully entered the R&D of the core environmental control system for lithography machines.
Release time:
2025-03-18
This domestically produced system will fully realize precise temperature control (±0.005℃) and maintain a class 100 cleanroom environment. Its Technical Index matches that of mainstream international lithography machines.
Recently,Nanjing Expand Technology's subsidiary,Jice (Nanjing) Technology Co., Ltd. announced a major technological advancement. The company signed a strategic agreement with a domestic semiconductor equipment manufacturer to fully independently research and develop a micro-environment control system adaptable to high-end lithography machines. This domestically produced system will fully realize
precise temperature control (±0.005℃)
and maintain a class 100 cleanroom environment. The Technical Index matches the configuration of international mainstream lithography machines.
It is worth noting that this research and development uses a completely independent technological approach. According to the person in charge of Jice Technology, the system has achieved original development from hardware modules to control algorithms. While maintaining the same performance, energy consumption is reduced by about 50% or more compared to conventional systems. This means that the domestic alternative not only breaks the technological blockade but also achieves iterative upgrades.
As a pioneer in the field of precision environmental control in China, Jice (Nanjing) has previously successfully provided complete environmental solutions for domestic lithography machines and wafer measurement equipment. This strategic breakthrough marks the company's official entry into the ranks of core subsystem suppliers for high-end lithography machines. Its independently developed temperature control system, ultra-clean airflow organization system, and other patented technologies have been verified by leading domestic wafer fabs.
Industry insiders point out that the domestic substitution of high-precision environmental control systems for lithography machines has dual strategic value: it ensures the supply chain security of equipment maintenance and provides flexible technical interfaces for subsequent equipment upgrades. This is of great significance to promoting the continuous innovation of domestic semiconductor equipment.
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